IsoSkin Set

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Production of an IsoSkin set. This set of three chemically milled copper parts fit together to form an assembly.

This assembly measures 27mm x 27mm x 1.5mm thick.

Tolerances are typically 0.025mm (0.001"). Please see drawings for dimension and tolerance specifications.

The small holes in the "Condenser" part will be EDM’ed, in a separate RFQ (#56262)

Material to be OFHC Copper C10100 (half-hard). Surface roughness to be 0.8 micrometer (32 microinch), or better. All surfaces to be reasonably free of blemishes and scratches.

Please contact buyer with any questions.

구매자 정보

산업 Engineering and Design
도시 / 지역 Las Vegas, Nevada
국가 USA

RFQ

RFQ 번호 357065
재질 Alloy Steel
재질 등급 OFHC Copper C10100

상세 기술적 요소

카테고리 케미칼 머시닝
치수

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케미칼 머시닝: Photo Chemical Machining (PCM) is also known as Photo Etching, Photo Chemical Milling, Photofabrication, Chemmilling and Chemical Blanking. Chemical machining is primarily used in the production of thin and decorative parts. Chemical milling is considered a precision process and is most commonly used to machine sheets and foils. Chemical machining is widely used in the electronics and aerospace industries. Common applications of photo chemical machining include integrated circuit lead frames, surface mount paste screens, optical attenuators, encoder disks, jewelry and meshes. Most commonly a photo-tool is produced to the exact geometry to be machined using a laser photo-plotter. The photo-tool selectively exposes a photographic film according to the computer-aided design (CAD) data. Photo-resists are UV light-sensitive polymers. Photo-resists are applied to the metal to be machined as a liquid by dip coating, flowing, roller-coating, or electrophoresis. The coating of the metal sheet with photo-resist sensitizes it. When this sensitized metal is put into the double-sided photo-tool and is exposed to UV light on both sides, an image is etched into the photo-resist. The photo-resist tool is then developed in a liquid formulation to form a durable image on both sides of the metal.